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Plasma technology plasmalab micro-p rie etcher system µ
Plasma Technology Plasmalab Micro-P ( P) Reactive Ion Etching System
The unit was removed in working condition and powers up. We do not have the rest of the facility requirements to formally test this item. All the interconnecting cables seem to be there to connect the controller to the main body. There are no pumps included however there are 2 valves on the back vacuum port.
* ENI ACG-3 (300W) RF Generator, Serial Number: 221
* Advanced Energy Control Panel, Part Number: 4013-014-A, Serial Number: 5663
* Setup for 4-Gas Input (Controlled by MFC's.)
* MFC 1 Setup: Vacuum General, Model: UC2-21S02, Serial Number: 407401186, Range: 0 - 100 SCCM, Gas: N2
* MFC 2 Setup: Vacuum General, Model: UC2-21S01, Serial Number: 407481186, Range: 0 - 100 SCCM, Gas: N2
* MFC 3 Setup: Vacuum General, Model: UC2-21S01, Serial Number: 396990986, Range: 0 - 100 SCCM, Gas: N2
* MFC 4 Setup: Vacuum General, Model: UC2-31S01, Serial Number: 399481086, Range: 0 - 1 SLM, Gas: N2
* Chamber Size: 11" I.D., OD: 11.75", 2" Depth (from chuck to top of chamber)
* VAT Gate Valve: F-39351-15
* Vacuum General Valve, Model: MDV-028, Serial Number: 423120487
* Vacuum General Valve Controller, Model: AC-2, Serial Number: 429660687, Software Revision: AC2C, Hardware Revision: D, Schematic Revision: D
* Vacuum General Pressure Transducer, Model: CMT-01, Serial Number: 408241286, Range: 1 Torr, Input: +15 VDC, Output: 0 - 10 VDC
* Unit Manufacture Date: 5/18/87
* Picture 3 - Chamber Unit, Front View, Up-Close
* Picture 4 - Control Unit, Front View, Up-Close
* Picture 5 - Chamber, Top View
* Picture 6 - Chamber, Top Plate, Up-Close
* Picture 7 - Chamber, Chuck, Up-Close
* Picture 8 - Main Control Panel (Advanced Energy Made)
* Picture 10 - Vacuum General AC-2 Valve Controller
* Picture 11 - ENI ACG-3 RF Generator
* Picture 12 - Control Unit, Inside Cabinet #1
* Picture 13 - Control Unit, Inside Cabinet #2
* Picture 14 - MFC / Gas Control Cabinet
