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> New 6 ushio high intensity superior uv lamps SUV2011NIH
New 6 ushio high intensity superior uv lamps SUV2011NIH
Our Asset #:KSC129 - 1225 A9 / 1 Qty available:6
6 NEW USHIO High Intensity Superior UV Lamps SUV2011NIH
FACTORY NEW replacement or price when new: $0.99
Condition: New Guaranty: See our 10 day DOA money back Guaranty!
100% of the proceeds from this sale go to Daily Bread FOOD BANK!
These units are PROPERLY HANDLED & STORED UPRIGHT in a climate controlled warehouse.
Ushio High Intensity Superior UV Lamp application: I Line stepper semiconductor and lifetime 750 h. These units came from a semiconductor wafer plant that closed and moved overseas. These bulbs were their new spare parts inventory.
USHIO High Intensity Superior UV Lamp SUV-2011NIH.
For NIKON semiconductor lithography System NRM-1000A
If you have any questions please call Mr. King directly at (***)-367-0140
Model: SUV-20011nh Serial #: na Year: na
HP/Amp/KW/KVA: Voltage: na Phase: na Other Info:
Fig.1 Outside view of the SUV-2011NIH lamp.
Overlay Measurement System NRM-1000A Full support for 130nm lithography, plus automatic measurement of NSR Focus Marks NRM- 1000A Main Features High precision Mounts a high-precision dedicated optical system with aberration closely controlled in the component and assembly production process. The objective lens has been designed specifically for this application, and the imaging system offers Nikon s exclusive high S/N ratio and high dynamic range characteristics. Offers full performance even for 130nm lithography. Maximum throughput Major improvements in stage positioning accuracy through enhanced rigidity, and enhanced global alignment (EGA) technology, assure correct alignment. The result is throughput performance of 150 wafers/hour (5 points/wafer), while a job reservation function eliminates lost time between lots. Superior recipe management functions Newly developed Nikon software offers excellent operability, minimizing the time required for recipe creation. And recipes are fully compatible with other Nikon overlay measurement systems. Networking enables recipe downloads from remote systems. Low running costs Users can replace lamps themselves as required. The illumination system makes any adjustment after lamp replacement unnecessary. Bright optics are achieved using an affordable halogen lamp. SEMI standard compliance, CE marking compliance, supports SMIF Indexers Options NSR Focus Mark measurement system Provides high-speed, precision measurement of Nikon s exclusive wedge-shaped focus management marks (NSR Focus Marks). Stepper management system The set-up and data processing methods, and output format, fully comply with the Automatic Measurement System (AMS) functions of the NSR series. This means that the stepper s auto-measurement function can be replaced by the NRM- 1000A and the stepper can be used exclusively for exposure, enhancing line productivity. Waferless recipe creation system Automatic recognition of stepper alignment marks and other unique patterns means it is possible to create recipes without wafers on the stage ideal for small-lot, multiple production. Measurement targets Box in box mark, bar in bar mark, NSR Focus Mark (option) Wafer size 200mm, 150mm (option) Repeatability 2nm (3 ) TIS (Tool Induced Shift) 3nm Tool matching 5nm Throughput 150 wafers/hour (5 points/wafer) Dimensions (WxDxH) Main body 1,350 x 1,530 x 1,950mm Control rack 650 x 1,200 x 1,610mm Weight Main body Approx. 1,000kg Control rack Approx. 400kg Specifications Full support for 130nm lithography, plus automatic measurement of NSR Focus Marks Combining Nikon s advanced technology and experience in the semiconductor lithography sector, as demonstrated by the NSR Series, to provide automatic measurement of overlay and NSR Focus Marks with high speed and exceptional precision.
Asset Location: TX Comfort 78013 Area: MECHANIC SHOP
a. Est. Wt. each: 2LBS b. Est. pkging wt: 3 c. Est. total wt: 5
